QUARTZ - THE ULTIMATE MASK MATERIAL FOR OPTICAL LITHOGRAPHY

被引：0
|
作者：
ZINSMEISTER, GJ
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1982年 / 333卷
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：40 / 47
页数：8
相关论文
共 50 条
  • [21] Gradient-Based Source and Mask Optimization in Optical Lithography
    Peng, Yao
    Zhang, Jinyu
    Wang, Yan
    Yu, Zhiping
    IEEE TRANSACTIONS ON IMAGE PROCESSING, 2011, 20 (10) : 2856 - 2864
  • [22] Optical lithography with printed metal mask and a simple superhydrophobic surface
    Kim, Tae-Il
    Baek, Chang hoon
    Suh, Kahp Y.
    Seo, Soon-min
    Lee, Hong H.
    SMALL, 2008, 4 (02) : 182 - 185
  • [23] Resolution enhancement in optical lithography using polarized film mask
    Yu, GB
    Lin, WM
    Chen, XZ
    Xing, TW
    Yao, HM
    FIFTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2004, 5774 : 567 - 570
  • [24] Analytic approach to understanding the impact of mask errors on optical lithography
    Mack, CA
    OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2, 2000, 4000 : 215 - 227
  • [25] SUBMICRON OPTICAL LITHOGRAPHY USING PHASE-SHIFTING MASK
    HASEGAWA, N
    TERASAWA, T
    TANAKA, T
    KUROSAKI, T
    DENKI KAGAKU, 1990, 58 (04): : 330 - 335
  • [26] Two-dimensional optical mask design and atom lithography
    Rostami, A
    Rahmani, A
    MICROELECTRONICS JOURNAL, 2006, 37 (01) : 57 - 63
  • [27] BINARY AND PHASE-SHIFTING MASK DESIGN FOR OPTICAL LITHOGRAPHY
    LIU, Y
    ZAKHOR, A
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1992, 5 (02) : 138 - 152
  • [28] Mask and Wafer Topography Effects in Optical and EUV-Lithography
    Erdmann, A.
    Shao, F.
    Evanschitzky, P.
    Fuehner, T.
    CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010), 2010, 27 (01): : 415 - 420
  • [29] Photonic Band Gap Synthesis by Optical Phase Mask Lithography
    Chan, Timothy Y. M.
    Toader, Ovidiu
    John, Sajeev
    2007 CONFERENCE ON LASERS & ELECTRO-OPTICS/QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2007), VOLS 1-5, 2007, : 1335 - 1336
  • [30] Pixelated source mask optimization for process robustness in optical lithography
    Jia, Ningning
    Lam, Edmund Y.
    OPTICS EXPRESS, 2011, 19 (20): : 19384 - 19398
12345