QUARTZ - THE ULTIMATE MASK MATERIAL FOR OPTICAL LITHOGRAPHY

被引：0
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作者：
ZINSMEISTER, GJ
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1982年 / 333卷
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：40 / 47
页数：8
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