STRUCTURE AND STOICHIOMETRY OF ANODIC FILMS ON V, NB, TA, MO, AND W

被引：0
|
作者：
ARORA, MR [1 ]
KELLY, R [1 ]
机构：
[1] MCMASTER UNIV, INST MAT RES, HAMILTON L8S 4M1, ONTARIO, CANADA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1975年 / 122卷 / 03期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C75 / C75
页数：1
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