X-RAY REFLECTIVITY AND SCANNING-TUNNELING-MICROSCOPE STUDY OF KINETIC ROUGHENING OF SPUTTER-DEPOSITED GOLD-FILMS DURING GROWTH

被引：156
|
作者：
YOU, H
CHIARELLO, RP
KIM, HK
VANDERVOORT, KG
机构：
[1] Materials Science Division, Argonne National Laboratory, Argonne
来源：
PHYSICAL REVIEW LETTERS | 1993年 / 70卷 / 19期
关键词：
D O I：
10.1103/PhysRevLett.70.2900
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
An in situ x-ray reflectivity study of the dynamic evolution of a growing interface was carried out for gold sputter-deposited onto a polished silicon substrate. X-ray reflectivity data were recorded during growth for thicknesses of the gold film ranging from 50 to 3500 angstrom. A progressive kinetic roughening of the gold-vacuum interface was observed and the time-dependent interfacial width exhibits a power-law behavior. Aided by scanning-tunneling-microscopy measurements the scaling exponents were determined and compared with theoretical studies.
引用
收藏
页码：2900 / 2903
页数：4
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