INFLUENCE OF IMPURITY GASES ON PROPERTIES OF CO-CR SPUTTERED FILMS

被引：1

|

作者：

SAGOI, M

NISHIKAWA, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 02期

关键词：

D O I：

10.1116/1.575747

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

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页码：166 / 169

页数：4

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