共 50 条
- [21] LATERAL EFFECT OF OXIDATION ON BORON-DIFFUSION IN (100) SILICONAPPLIED PHYSICS LETTERS, 1979, 35 (10) : 799 - 801LIN, AMDUTTON, RWANTONIADIS, DA
- [22] THE BORON-DIFFUSION IN SILICON - PROFILE AND DATA-ANALYSISJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (08) : C328 - C328GAISEANU, FLOGHIN, VDIMA, I
- [23] ON THE BORON-DIFFUSION IN WEAKLY N-DOPED SILICONREVUE ROUMAINE DE PHYSIQUE, 1984, 29 (05): : 489 - 491GAISEANU, F
- [24] BORON-DIFFUSION PROFILE IN SILICON AND DATA-ANALYSISJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (09) : 2287 - 2289GAISEANU, F
- [25] CONCENTRATION-DEPENDENCE OF THE BORON-DIFFUSION COEFFICIENT IN SILICONPHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 76 (01): : K85 - K88DAO, KALE, HMPHAM, H
- [26] BORON-DIFFUSION DURING ELECTRON PULSE ANNEALING OF SILICONJOURNAL OF APPLIED PHYSICS, 1983, 54 (04) : 2111 - 2113DILHAC, JMGANIBAL, CVIALARET, GMARTINEZ, A
- [27] AES STUDY OF BORON-DIFFUSION IN SILICON FROM A BORON-NITRIDE SOURCE WITH HYDROGEN INJECTIONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) : 1805 - 1810PIGNATEL, GQUEIROLO, G
- [28] ARSENIC AND BORON-DIFFUSION IN SILICON FROM IMPLANTED COBALT SILICIDE LAYERSSEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1995, 10 (10) : 1362 - 1367LAVIA, FSPINELLA, CRIMINI, E
- [29] SIMULATION OF THE BORON-DIFFUSION IN SILICON FROM A BBR3 SOURCEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C318 - C318GAISEANU, F
- [30] EFFECT OF STRESS IN THE DEPOSITED SILICON-NITRIDE FILMS ON BORON-DIFFUSION OF SILICONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (01) : 202 - 206OSADA, KZAITSU, YMATSUMOTO, SYOSHIDA, MARAI, EABE, T