REACTIVE DUAL ION-BEAM SPUTTERING OF OXIDE-FILMS

被引：15

|

作者：

SCAGLIONE, S

EMILIANI, G

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572820

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：2702 / 2703

页数：2

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