REACTIVE DUAL ION-BEAM SPUTTERING OF OXIDE-FILMS

被引：15
|
作者：
SCAGLIONE, S
EMILIANI, G
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期
关键词：
D O I：
10.1116/1.572820
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2702 / 2703
页数：2
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