CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE AT LOW-TEMPERATURES

被引：224
|
作者：
KURTZ, SR [1 ]
GORDON, RG [1 ]
机构：
[1] HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138
来源：
THIN SOLID FILMS | 1986年 / 140卷 / 02期
关键词：
We should like to thank the Watkins-Johnson Company for use of its nozzle and the Spire Corporation for the hardness tests. We should also like to thank J. Chapple-Sokol; D. Wink and J. Hayes for useful conversations. We gratefully acknowledge financial support from the Solar Energy Research Institute; the National Science Foundation and the Materials Research Laboratory at Harvard University;
D O I：
10.1016/0040-6090(86)90271-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
12
引用
收藏
页码：277 / 290
页数：14
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