DIFFUSION CROSSTALK BETWEEN PHOTOSENSING ELEMENTS IN SILICON STRUCTURES

被引：0
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作者：
BLYNSKII, VI
KULIKOV, AY
OSINSKII, VI
RAKHLEI, SY
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来源：
DOKLADY AKADEMII NAUK BELARUSI | 1989年 / 33卷 / 02期
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中图分类号：
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号：
07 ; 0710 ; 09 ;
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页码：117 / 120
页数：4
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