PROPERTIES OF TELLURIUM-DOPED EPITAXIAL BISMUTH-FILMS

被引:12
|
作者
HEREMANS, J
MORELLI, DT
PARTIN, DL
OLK, CH
THRUSH, CM
PERRY, TA
机构
来源
PHYSICAL REVIEW B | 1988年 / 38卷 / 15期
关键词
D O I
10.1103/PhysRevB.38.10280
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:10280 / 10284
页数:5
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