HYDROGEN PLASMA-ETCHING OF PYROMERIC CARBON-FILMS

被引：4
|
作者：
PARK, S
WALSER, RM
机构：
[1] Univ of Texas at Austin, Dep of, Electrical & Computer, Engineering, Austin, TX, USA, Univ of Texas at Austin, Dep of Electrical & Computer Engineering, Austin, TX, USA
来源：
CARBON | 1985年 / 23卷 / 06期
关键词：
AMORPHOUS - CARBON FILMS - HYDROGEN PLASMA ETCHING - INTERNAL STRESS - THIN FILMS;
D O I：
10.1016/0008-6223(85)90231-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
(Edited Abstract)
引用
收藏
页码：701 / 706
页数：6
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