PHOTOELECTRON MEAN FREE-PATH CHEMICAL-COMPOSITION DEPENDENCE AND ELASTIC-SCATTERING AND ANALYZER ACCEPTANCE ANGLE FINITENESS EFFECTS IN RESTORING CONCENTRATION PROFILES FROM ANGULAR RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY DATA

被引：28

作者：

BASCHENKO, OA

机构：

[1] N.S. Kurnakov Institute of General and Inorganic Chemistry, USSR Academy of Sciences, 117907 Moscow

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1991年 / 57卷 / 3-4期

关键词：

D O I：

10.1016/0368-2048(91)80016-N

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

A numerical technique for restoration of non-destructive depth-concentration profiles from angular resolved X-ray photoelectron spectroscopy (ARXPS) data taking into account photoelectron mean free path chemical composition dependence has been proposed. The numerical procedure developed earlier has been modified to a minor extent with the restoration problem retaining linearity. The capabilities of the technique have been demonstrated in terms of experimental ARXPS data for polyurethane film on golden substrate. The photoelectron elastic scattering and analyzer acceptance angle finiteness effects have been discussed as well.

引用

页码：297 / 305

页数：9

共 29 条

[1]

ABASHKIN YG, 1989, POVERKHNOST, P71

[2]

Band I. M., 1979, Atomic Data and Nuclear Data Tables, V23, P443, DOI 10.1016/0092-640X(79)90027-5

[3] DEPTH PROFILING OF ELEMENTS IN SURFACE-LAYERS OF SOLIDS BASED ON ANGULAR RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY [J].