PLASMA STIMULATED MOCVD OF GAAS

被引：35
|
作者：
HEINECKE, H [1 ]
BRAUERS, A [1 ]
LUTH, H [1 ]
BALK, P [1 ]
机构：
[1] RHEIN WESTFAL TH AACHEN,SONDERFORSCH BEREICH 202,D-5100 AACHEN,FED REP GER
来源：
JOURNAL OF CRYSTAL GROWTH | 1986年 / 77卷 / 1-3期
关键词：
D O I：
10.1016/0022-0248(86)90308-8
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
引用
收藏
页码：241 / 249
页数：9
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