TI-N PHASES FORMED BY REACTIVE ION PLATING

被引：100
|
作者：
MOLARIUS, JM [1 ]
KORHONEN, AS [1 ]
RISTOLAINEN, EO [1 ]
机构：
[1] HELSINKI UNIV TECHNOL,DEPT MIN & MET,PHYS MET LAB,SF-02150 ESPOO 15,FINLAND
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期
关键词：
D O I：
10.1116/1.572850
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2419 / 2425
页数：7
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