GENERALIZED TECHNIQUE FOR MEASURING SPECIFIC CONTACT RESISTANCE

被引：0

作者：

MEIER, DL ^{[1
]}

RAICHOUDHURY, P ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP, CTR RES & DEV, PITTSBURGH, PA 15235 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C99 / C99

页数：1

共 50 条

[31] A TECHNIQUE FOR MEASURING SMALL FAST CHANGES IN RESISTANCE
ANDERSON, D
ANDERSON, JM
SEVILLE, AH
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1968, 1 (04): : 423 - &
[32] A NOVEL TECHNIQUE TO MEASURE THE CONTACT RESISTANCE OF A MOSFET
NG, KK
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (03) : 544 - 547
[33] RESISTANCE DIFFERENCE TECHNIQUE FOR CONTACT STATE IDENTIFICATION
BERGMAN, GD
INTERNATIONAL JOURNAL OF ELECTRONICS, 1982, 53 (01) : 57 - 62
[34] NEW INSTRUMENT FOR MEASURING CONTACT RESISTANCE DEVELOPED FOR STUDYING ELECTRICAL CONTACT PHENOMENA
WATANABE, Y
WEAR, 1986, 112 (01) : 1 - 15
[35] THEORETICAL LIMITATION ON SPECIFIC CONTACT RESISTANCE IN SEMICONDUCTORS
GUPTA, RP
DUBEY, RC
KHOKLE, WS
INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 1990, 28 (03) : 126 - 130
[36] Specific contact resistance at extremely low temperatures
Akiya, M
Aihara, M
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (02) : 271 - 273
[37] THE EFFECTS OF CONTACT SIZE AND NON-ZERO METAL RESISTANCE ON THE DETERMINATION OF SPECIFIC CONTACT RESISTANCE
MARLOW, GS
DAS, MB
SOLID-STATE ELECTRONICS, 1982, 25 (02) : 91 - 94
[38] DETERMINING SPECIFIC CONTACT RESISTIVITY FROM CONTACT END RESISTANCE MEASUREMENTS
CHERN, JGJ
OLDHAM, WG
IEEE ELECTRON DEVICE LETTERS, 1984, 5 (05) : 178 - 180
[39] SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR OHMIC CONTACT.
Chen, Cunli
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1983, 4 (02): : 191 - 193
[40] ELECTRON BEAM TECHNIQUE FOR MEASURING MICROVOLT CHANGES IN CONTACT POTENTIAL
STEINRIS.F
HETRICK, RE
REVIEW OF SCIENTIFIC INSTRUMENTS, 1971, 42 (03): : 304 - &

← 1 2 3 4 5 →