VACUUM-ULTRAVIOLET SUBSTRATE CLEANING AND ETCHING

被引：0
|
作者：
ALLEN, LR
GRANT, JM
NGUYEN, T
VALIEV, K
VELIKOV, L
MESHMAN, B
机构：
[1] RUSSIAN ACAD SCI,INST PHYS & TECHNOL,MOSCOW 117901,RUSSIA
[2] INT RES & SEMICOND EQUIPMENT TECHNOL INC,SAN JOSE,CA
来源：
SOLID STATE TECHNOLOGY | 1995年 / 38卷 / 05期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Light in the vacuum ultraviolet region (120-160 nm) promotes high quantum efficiency photoexcited processes (e.g., C-C bond breaking, oxygen molecule dissociation), has a very small penetration depth (30-50 nm), and can be used effectively in silicon surface cleaning. This article discusses potential applications of this technology and describes a vacuum ultraviolet light source.
引用
收藏
页码：77 / &
相关论文
共 50 条
  • [1] Vacuum-ultraviolet photodetectors
    Lemin Jia
    Wei Zheng
    Feng Huang
    PhotoniX, 1
  • [2] Vacuum-ultraviolet source
    Pile, David F. P.
    NATURE PHOTONICS, 2018, 12 (10) : 568 - 568
  • [3] Spectroscopy in the vacuum-ultraviolet
    Nelson de Oliveira
    Denis Joyeux
    Laurent Nahon
    Nature Photonics, 2011, 5 : 249 - 249
  • [4] Spectroscopy in the vacuum-ultraviolet
    M. Agåker
    J. Andersson
    J. C. Englund
    J. Rausch
    J.-E. Rubensson
    J. Nordgren
    Nature Photonics, 2011, 5 : 248 - 248
  • [5] Spectroscopy in the vacuum-ultraviolet
    Agaker, M.
    Andersson, J.
    Englund, J. C.
    Rausch, J.
    Rubensson, J. -E.
    Nordgren, J.
    NATURE PHOTONICS, 2011, 5 (05) : 248 - 248
  • [6] Vacuum-ultraviolet photodetectors
    Jia, Lemin
    Zheng, Wei
    Huang, Feng
    PHOTONIX, 2020, 1 (01)
  • [7] Vacuum-ultraviolet source
    David F. P. Pile
    Nature Photonics, 2018, 12 : 568 - 568
  • [8] Vacuum-Ultraviolet Lasers and Spectroscopy
    Hollenstein, U.
    SHORT-WAVELENGTH IMAGING AND SPECTROSCOPY SOURCES, 2012, 8678
  • [9] Vacuum-ultraviolet photodecomposition of stannane
    Aaserud, DJ
    Lampe, FW
    JOURNAL OF PHYSICAL CHEMISTRY, 1996, 100 (24): : 10215 - 10222
  • [10] Vacuum-ultraviolet photolysis of polymers
    Hollander, A
    Behnisch, J
    SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 855 - 858
12345