RATE OF ETCHING OF HEAVILY DOPED THIN POLYCRYSTALLINE SILICON FILMS

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作者：
KOLESHKO, VM
KOVALEVSKII, AA
NEKARYUKIN, IV
REZNIKOV, BS
机构：
来源：
JOURNAL OF APPLIED CHEMISTRY OF THE USSR | 1975年 / 48卷 / 09期
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中图分类号：
O69 [应用化学];
学科分类号：
081704 ;
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页码：2010 / 2012
页数：3
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