MATERIAL REACTION AND SILICIDE FORMATION AT THE REFRACTORY-METAL SILICON INTERFACE

被引:40
|
作者
RUBLOFF, GW [1 ]
TROMP, RM [1 ]
VANLOENEN, EJ [1 ]
机构
[1] INST ATOM & MOLEC PHYS,1098 SJ AMSTERDAM,NETHERLANDS
关键词
D O I
10.1063/1.96829
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1600 / 1602
页数:3
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