MATERIAL REACTION AND SILICIDE FORMATION AT THE REFRACTORY-METAL SILICON INTERFACE

被引：40
|
作者：
RUBLOFF, GW [1 ]
TROMP, RM [1 ]
VANLOENEN, EJ [1 ]
机构：
[1] INST ATOM & MOLEC PHYS,1098 SJ AMSTERDAM,NETHERLANDS
来源：
APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 23期
关键词：
D O I：
10.1063/1.96829
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1600 / 1602
页数：3
相关论文
共 50 条
  • [1] REFRACTORY-METAL SILICIDE FORMATION BY SPUTTERING A REFRACTORY-METAL ON HEATED SI SUBSTRATES
    TANIELIAN, M
    BLACKSTONE, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 714 - 717
  • [2] MICROSTRUCTURAL INVESTIGATIONS OF REFRACTORY-METAL SILICIDE FILMS ON SILICON
    MAGEE, TJ
    WOOLHOUSE, GR
    KAWAYOSHI, HA
    NIEMEYER, IC
    RODRIGUES, B
    ORMOND, RD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04): : 756 - 761
  • [3] SILICIDE FORMATION BY LASER-HEATING OF SPUTTERED REFRACTORY-METAL FILMS ON SILICON
    MOHAMMADI, F
    SARASWAT, KC
    BEAUDOUIN, J
    MEINDL, JD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) : C124 - C124
  • [4] REFRACTORY-METAL SILICIDE FORMATION INDUCED BY AS+ IMPLANTATION
    TSAI, MY
    PETERSSON, CS
    DHEURLE, FM
    MANISCALCO, V
    APPLIED PHYSICS LETTERS, 1980, 37 (03) : 295 - 298
  • [5] REFRACTORY-METAL SILICIDE FORMATION BY ION-IMPLANTATION
    WANG, KL
    CHIANG, SW
    BACON, F
    REIHL, RF
    THIN SOLID FILMS, 1980, 74 (02) : 239 - 244
  • [6] REFRACTORY-METAL SILICIDE FORMATION WITH E-BEAM AND LASER PULSES.
    D'Anna, E.
    Leggieri, G.
    Luches, A.
    Majni, G.
    Vide, les Couches Minces, 1987, 42 (236): : 67 - 69
  • [7] REFRACTORY-METAL SILICIDE FORMATION WITH E-BEAM AND LASER-PULSES
    DANNA, E
    LEGGIERI, G
    LUCHES, A
    MAJNI, G
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1987, 42 (236): : 67 - 69
  • [8] REACTION AT A REFRACTORY-METAL SEMICONDUCTOR INTERFACE - V/GAAS(110)
    GRIONI, M
    JOYCE, JJ
    WEAVER, JH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 918 - 921
  • [9] REFRACTORY-METAL SILICIDE FORMATION BY ION-BEAM MIXING AND RAPID THERMAL ANNEALING
    KWONG, DL
    MEYERS, DC
    ALVI, NS
    LI, LW
    NORBECK, E
    APPLIED PHYSICS LETTERS, 1985, 47 (07) : 688 - 691
  • [10] LASER-ANNEALED REFRACTORY-METAL SILICIDE FILMS ON GAAS
    ANDERSON, WT
    CHRISTOU, A
    THOMPSON, PE
    GOSSETT, CR
    ERIDON, JM
    HATZOPOULOS, Z
    EFTHIMIOPOULOS, T
    KUDUMAS, M
    MICHELAKIS, C
    MORGAN, DV
    ELECTRONICS LETTERS, 1990, 26 (01) : 62 - 64
12345