HYDROGEN ADSORPTION ON THIN LOW-TEMPERATURE DEPOSITED UNSINTERED GOLD-FILMS

被引：3
|
作者：
STOBINSKI, L
DUS, R
机构：
[1] Institute of Physical Chemistry, Polish Acad. Sci., Warszawa, 01-224
来源：
CZECHOSLOVAK JOURNAL OF PHYSICS | 1993年 / 43卷 / 9-10期
关键词：
D O I：
10.1007/BF01595299
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
It has been found that molecular hydrogen does adsorb at 78 K on unsintered thin gold films deposited at low temperature, while sintering of these films at 420 K precludes H-2 chemisorption. The adsorbate is characterized by a single TD peak with a maximum placed at 125 K. The rate of desorption fits neither the first nor the second order kinetic equations exactly.
引用
收藏
页码：1035 / 1040
页数：6
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