AUGER AND PHOTOELECTRON CONTRIBUTIONS TO THE ELECTRON-YIELD SURFACE EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE SIGNAL

被引：72
|
作者：
STOHR, J
NOGUERA, C
KENDELEWICZ, T
机构：
[1] UNIV PARIS 11,CTR ORSAY,PHYS SOLIDE LAB,F-91405 ORSAY,FRANCE
[2] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
[3] STANFORD SYNCHROTRON RADIAT LAB,STANFORD,CA 94305
来源：
PHYSICAL REVIEW B | 1984年 / 30卷 / 10期
关键词：
D O I：
10.1103/PhysRevB.30.5571
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：5571 / 5579
页数：9
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