TITANIUM SILICON AND SILICON DIOXIDE REACTIONS CONTROLLED BY LOW-TEMPERATURE RAPID THERMAL ANNEALING

被引：25
|
作者：
BRILLSON, LJ [1 ]
SLADE, ML [1 ]
RICHTER, HW [1 ]
VANDERPLAS, H [1 ]
FULKS, RT [1 ]
机构：
[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期
关键词：
D O I：
10.1116/1.573772
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：993 / 997
页数：5
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