BILEVEL POLYSILOXANE RESIST FOR ION-BEAM AND ELECTRON-BEAM LITHOGRAPHY

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作者：
BRAULT, RG
KUBENA, RL
METZGER, RA
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1985年 / 539卷
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O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：70 / 73
页数：4
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