BILEVEL POLYSILOXANE RESIST FOR ION-BEAM AND ELECTRON-BEAM LITHOGRAPHY

被引：0
|
作者：
BRAULT, RG
KUBENA, RL
METZGER, RA
机构：
来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1985年 / 539卷
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：70 / 73
页数：4
相关论文
共 50 条
  • [1] A BILEVEL RESIST FOR ION-BEAM LITHOGRAPHY
    MILGRAM, A
    PURETZ, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03): : 879 - 883
  • [2] RESIST POSSIBILITIES IN ION-BEAM LITHOGRAPHY
    MACRANDER, A
    BARR, D
    WAGNER, A
    OPTICAL ENGINEERING, 1983, 22 (02) : 215 - 219
  • [3] Blazed reflection gratings with electron-beam lithography and ion-beam etching
    Miles, Drew M.
    McEntaffer, Randall L.
    Grise, Fabien
    SPACE TELESCOPES AND INSTRUMENTATION 2022: ULTRAVIOLET TO GAMMA RAY, 2022, 12181
  • [4] RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY
    LIU, W
    INGINO, J
    PEASE, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1979 - 1983
  • [5] RESIST MATERIALS FOR ELECTRON-BEAM LITHOGRAPHY
    LAI, JH
    JOURNAL OF IMAGING TECHNOLOGY, 1985, 11 (04): : 164 - 167
  • [6] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
    YONEDA, Y
    KITAMURA, K
    NAITO, J
    KITAKOHJI, T
    OKUYAMA, H
    MURAKAWA, K
    POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16): : 1110 - 1114
  • [7] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
    YONEDA, Y
    KITAMURA, K
    MIYAGAWA, M
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1982, 18 (03): : 453 - 467
  • [8] Resist charging in electron-beam lithography
    Bai, M
    Picard, D
    Tanasa, C
    McCord, MA
    Berglund, CN
    Pease, RFW
    18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3546 : 383 - 388
  • [9] RESIST POSSIBILITIES AND LIMITATIONS IN ION-BEAM LITHOGRAPHY
    MACRANDER, A
    BARR, D
    WAGNER, A
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 333 : 142 - 151
  • [10] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY.
    Yoneda, Yasuhiro
    Kitamura, Kenroh
    Miyagawa, Masashi
    Fujitsu Scientific and Technical Journal, 1982, 18 (03): : 453 - 467
12345