VOLTAGE-DEPENDENT SCANNING TUNNELING MICROSCOPY IMAGING OF SEMICONDUCTOR SURFACES

被引：113
|
作者：
STROSCIO, JA [1 ]
FEENSTRA, RM [1 ]
NEWNS, DM [1 ]
FEIN, AP [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 02期
关键词：
D O I：
10.1116/1.575368
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：499 / 507
页数：9
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