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EFFECTS OF SUBSTRATE PREPARATION CONDITIONS ON GAAS OVAL DEFECTS GROWN BY MOLECULAR-BEAM EPITAXY
被引:16
|
作者
:
FUJIWARA, K
论文数:
0
引用数:
0
h-index:
0
FUJIWARA, K
NISHIKAWA, Y
论文数:
0
引用数:
0
h-index:
0
NISHIKAWA, Y
TOKUDA, Y
论文数:
0
引用数:
0
h-index:
0
TOKUDA, Y
NAKAYAMA, T
论文数:
0
引用数:
0
h-index:
0
NAKAYAMA, T
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1986年
/ 48卷
/ 11期
关键词
:
D O I
:
10.1063/1.96748
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:701 / 703
页数:3
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