CATALYTIC CHEMICAL VAPOR-DEPOSITION (CTL-CVD) METHOD PRODUCING HIGH-QUALITY HYDROGENATED AMORPHOUS-SILICON

被引：131
|
作者：
MATSUMURA, H
机构：
[1] Hiroshima Univ, Hiroshima, Jpn, Hiroshima Univ, Hiroshima, Jpn
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1986年 / 25卷 / 12期
关键词：
DEPOSITION GAS - HEATER-CATALYZER - PHOTOSENSITIVITY;
D O I：
10.1143/JJAP.25.L949
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L949 / L951
页数：3
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