LOW-TEMPERATURE EPITAXIAL-GROWTH OF GAAS ON (100) SILICON SUBSTRATES

被引:7
|
作者
CHRISTOU, A
WILKINS, BR
TSENG, WF
机构
[1] US Naval Research Lab, Washington,, DC, USA, US Naval Research Lab, Washington, DC, USA
关键词
D O I
10.1049/el:19850289
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
SEMICONDUCTING GALLIUM ARSENIDE
引用
收藏
页码:406 / 408
页数:3
相关论文
共 50 条
  • [31] EPITAXIAL-GROWTH OF BI ON GAAS(100) SURFACES
    HORNG, S
    KAHN, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (04): : 931 - 935
  • [32] LOW-TEMPERATURE SILICON GERMANIUM EPITAXIAL-GROWTH ON SILICON USING CONTAMINATION-MINIMIZED CVD PROCESSING
    CHENG, ML
    SATO, T
    KOBAYASHI, S
    KOHLHASE, A
    MUROTA, J
    MIKOSHIBA, N
    FIRST INTERNATIONAL MEETING ON ADVANCED PROCESSING AND CHARACTERIZATION TECHNOLOGIES: FABRICATION AND CHARACTERIZATION OF SEMICONDUCTOR OPTOELECTRONIC DEVICES AND INTEGRATED CIRCUITS, VOLS 1 AND 2, 1989, : A107 - A110
  • [33] Epitaxial low-temperature growth of In0.5Ga0.5As films on GaAs(100) and GaAs(111)A substrates using a metamorphic buffer
    G. B. Galiev
    I. N. Trunkin
    E. A. Klimov
    A. N. Klochkov
    A. L. Vasiliev
    R. M. Imamov
    S. S. Pushkarev
    P. P. Maltsev
    Crystallography Reports, 2017, 62 : 947 - 954
  • [34] LOW-TEMPERATURE EPITAXIAL-GROWTH OF ZN CHALCOGENIDES ON GAAS(001) BY POSTHEATED MOLECULAR-BEAMS
    YONETA, M
    HAMASAKI, T
    OHISHI, M
    SAITO, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (03): : 878 - 880
  • [35] Epitaxial low-temperature growth of In0.5Ga0.5As films on GaAs(100) and GaAs(111)A substrates using a metamorphic buffer
    Galiev, G. B.
    Trunkin, I. N.
    Klimov, E. A.
    Klochkov, A. N.
    Vasiliev, A. L.
    Imamov, R. M.
    Pushkarev, S. S.
    Maltsev, P. P.
    CRYSTALLOGRAPHY REPORTS, 2017, 62 (06) : 947 - 954
  • [36] LOW-TEMPERATURE SURFACE CLEANING OF SI AND SUCCESSIVE PLASMA-ASSISTED EPITAXIAL-GROWTH OF GAAS
    QING, ZG
    HARIU, T
    ONO, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (10): : L1576 - L1578
  • [37] THE EFFECT OF HYDROGEN PLASMA ON THE LOW-TEMPERATURE EPITAXIAL-GROWTH OF INSB
    OHSHIMA, T
    YAMAUCHI, S
    HARIU, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (01): : L13 - L15
  • [38] LOW-TEMPERATURE EPITAXIAL-GROWTH OF THIN METAL-FILMS
    EVANS, JW
    SANDERS, DE
    THIEL, PA
    DEPRISTO, AE
    PHYSICAL REVIEW B, 1990, 41 (08): : 5410 - 5413
  • [39] Low-Temperature epitaxial growth of InGaAs films on InP(100) and InP(411)A substrates
    G. B. Galiev
    E. A. Klimova
    S. S. Pushkarev
    A. N. Klochkov
    I. N. Trunkin
    A. L. Vasiliev
    P. P. Maltsev
    Crystallography Reports, 2017, 62 : 589 - 596
  • [40] Low-Temperature epitaxial growth of InGaAs films on InP(100) and InP(411)A substrates
    Galiev, G. B.
    Klimov, E. A.
    Pushkarev, S. S.
    Klochkov, A. N.
    Trunkin, I. N.
    Vasiliev, A. L.
    Maltsev, P. P.
    CRYSTALLOGRAPHY REPORTS, 2017, 62 (04) : 589 - 596