INTERPRETATION OF LOW-VOLTAGE PHOTOMEASUREMENTS IN METAL-INSULATOR-METAL FILMS

被引：12
|
作者：
SCHUERME.FL
CRAWFORD, JA
机构：
来源：
APPLIED PHYSICS LETTERS | 1966年 / 9卷 / 08期
关键词：
D O I：
10.1063/1.1754766
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：317 / &
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