MORPHOLOGICAL AND CHEMICAL CONSIDERATIONS FOR THE EPITAXY OF METALS ON SEMICONDUCTORS

被引：26
作者：
LUDEKE, R
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1984年 / 2卷 / 03期
关键词：
D O I：
10.1116/1.582833
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：400 / 406
页数：7
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