THIN-FILM FORMATION USING SINGLE-GRID ION-BEAM SPUTTERING

被引：4
|
作者：
NISHIMURA, C
YANAGISAWA, K
TAGO, A
TOSHIMA, T
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1987年 / 5卷 / 03期
关键词：
D O I：
10.1116/1.574157
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：343 / 346
页数：4
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