THERMAL DIFFUSE LOW-ENERGY ELECTRON-DIFFRACTION ON THE SI(111)2X1 STRUCTURE

被引:2
|
作者
YAMAGUCHI, T
HARADA, K
机构
来源
PHYSICAL REVIEW B | 1988年 / 38卷 / 05期
关键词
D O I
10.1103/PhysRevB.38.3400
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
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页码:3400 / 3408
页数:9
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