THERMAL DIFFUSE LOW-ENERGY ELECTRON-DIFFRACTION ON THE SI(111)2X1 STRUCTURE

被引：2
|
作者：
YAMAGUCHI, T
HARADA, K
机构：
来源：
PHYSICAL REVIEW B | 1988年 / 38卷 / 05期
关键词：
D O I：
10.1103/PhysRevB.38.3400
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：3400 / 3408
页数：9
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