THERMAL NITRIDATION OF SILICON AND SILICON DIOXIDE FOR THIN GATE INSULATORS .1.

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作者：
NEMETZ, JA
TRESSLER, RE
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来源：
SOLID STATE TECHNOLOGY | 1983年 / 26卷 / 02期
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：79 / 85
页数：7
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