QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY USING ELEMENTAL SENSITIVITY FACTORS

被引：96
|
作者：
PALMBERG, PW [1 ]
机构：
[1] PHYS ELECTR IND INC,6509 FLYING CLOUD DR,EDEN PRAIRIE,MN 55343
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期
关键词：
D O I：
10.1116/1.568853
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：214 / 218
页数：5
相关论文
共 50 条
  • [41] MATRIX DEPENDENCE OF RELATIVE SENSITIVITY FACTOR IN AUGER-ELECTRON SPECTROSCOPY
    GENNAI, N
    TETSU TO HAGANE-JOURNAL OF THE IRON AND STEEL INSTITUTE OF JAPAN, 1985, 71 : 1217 - 1217
  • [42] QUANTITATIVE-DETERMINATION OF ATOMIC CONCENTRATIONS BY AUGER-ELECTRON SPECTROSCOPY
    GOLDSTEIN, Y
    MANY, A
    MILLO, O
    WEISZ, SZ
    RESTO, O
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06): : 3130 - 3133
  • [43] BACKGROUND IN AUGER-ELECTRON SPECTROSCOPY
    LANGERON, JP
    VACUUM, 1988, 38 (11) : 1054 - 1054
  • [44] AUGER-ELECTRON SPECTROSCOPY OF ADSORBED LAYERS - QUANTITATIVE-ANALYSIS
    GOLDSTEIN, Y
    MILLO, O
    MANY, A
    VACUUM, 1990, 41 (7-9) : 1595 - 1597
  • [45] AUGER-ELECTRON SPECTROSCOPY - REVIEW
    JOHNSON, WC
    JOSHI, A
    STEIN, DF
    CANADIAN JOURNAL OF SPECTROSCOPY, 1972, 17 (03): : 88 - &
  • [46] APPLICATIONS OF AUGER-ELECTRON SPECTROSCOPY
    不详
    RESEARCH-DEVELOPMENT, 1973, 24 (07): : 36 - 38
  • [47] DECONVOLUTION IN AUGER-ELECTRON SPECTROSCOPY
    CHORNIK, B
    BISHOP, HE
    LEMOEL, A
    LEGRESSUS, C
    SCANNING ELECTRON MICROSCOPY, 1986, 1986 : 77 - 88
  • [48] AUGER-ELECTRON SPECTROSCOPY OF DENTIN - ELEMENTAL QUANTIFICATION AND THE EFFECTS OF ELECTRON AND ION-BOMBARDMENT
    MILLER, RG
    BOWLES, CQ
    EICK, JD
    GUTSHALL, PL
    DENTAL MATERIALS, 1993, 9 (04) : 280 - 285
  • [49] INELASTIC-SCATTERING EFFECTS IN QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY
    MARTIN, AD
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1975, 8 (17) : 2074 - 2078
  • [50] QUANTITATIVE-ANALYSIS OF ADSORBED LAYERS BY AUGER-ELECTRON SPECTROSCOPY
    MILLO, O
    MANY, A
    GOLDSTEIN, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (04): : 2688 - 2694
12345