GROWTH AND CHARACTERIZATION OF INSITU (IN,GA)AS OHMIC CONTACTS TO N-GAAS

被引:0
|
作者
WRIGHT, SL
MARKS, RF
MARSHALL, ED
SHIH, YC
YOUNG, AB
机构
关键词
D O I
10.1016/0022-0248(89)90392-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:245 / 246
页数:2
相关论文
共 50 条
  • [21] OHMIC CONTACTS ON N-GAAS PRODUCED BY LASER ALLOYING OF GE FILMS
    BADERTSCHER, G
    SALATHE, RP
    LUTHY, W
    ELECTRONICS LETTERS, 1980, 16 (04) : 113 - 114
  • [22] BACKSCATTERING ANALYSIS OF AUGE-NI OHMIC CONTACTS OF N-GAAS
    COHEN, DD
    KALKUR, TS
    SUTHERLAND, GJ
    NASSIBIAN, AG
    JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) : 3100 - 3104
  • [23] SCANNED ELECTRON-BEAM ALLOYED OHMIC CONTACTS TO N-GAAS
    KALKUR, TS
    NASSIBIAN, AG
    SOLID-STATE ELECTRONICS, 1987, 30 (06) : 619 - 625
  • [24] EFFECTS OF AU ON NIGE(AU)W OHMIC CONTACTS TO N-GAAS
    LUSTIG, N
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (03): : 1224 - 1225
  • [25] IMPROVEMENT OF OHMIC CONTACTS ON GAAS WITH INSITU CLEANING
    REN, F
    EMERSON, AB
    PEARTON, SJ
    FULLOWAN, TR
    BROWN, JM
    APPLIED PHYSICS LETTERS, 1991, 58 (10) : 1030 - 1032
  • [26] NONALLOYED OHMIC CONTACTS TO N-GAAS USING EPITAXIAL N-GE LAYER
    PAI, CS
    SAWADA, T
    MARSHALL, ED
    CHEN, WX
    LAU, SS
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (06) : C221 - C221
  • [27] STABLE OHMIC CONTACTS TO N-GAAS USING ION-BEAM MIXING
    SMITH, SR
    SOLOMON, JS
    MATERIALS LETTERS, 1985, 3 (7-8) : 294 - 298
  • [28] METAL PENETRATION AND DOPANT REDISTRIBUTION BENEATH ALLOYED OHMIC CONTACTS TO N-GAAS
    SHAPPIRIO, JR
    LAREAU, RT
    LUX, RA
    FINNEGAN, JJ
    SMITH, DD
    HEATH, LS
    TAYSINGLARA, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 1503 - 1507
  • [29] Interfacial reactions of Ni-In and Ni/In/Ni ohmic contacts to n-GaAs
    1600, American Inst of Physics, Woodbury, NY, USA (78):
  • [30] Low resistance ohmic contacts to n-GaAs for application in GaAs/AlGaAs quantum cascade lasers
    Karbownik, Piotr
    Baranska, Anna
    Szerling, Anna
    Macherzynski, Wojciech
    Papis, Ewa
    Kosiel, Kamil
    Bugajski, Maciej
    Tlaczala, Marek
    Jakiela, Rafal
    OPTICA APPLICATA, 2009, 39 (04) : 655 - 661