EFFECT OF INSTABILITY IN INTERFERENCE PATTERN LOCATION ON HOLOGRAM QUALITY

被引：0
|
作者：
VOROBEV, SP
机构：
来源：
SOVIET JOURNAL OF OPTICAL TECHNOLOGY | 1983年 / 50卷 / 09期
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中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：539 / 540
页数：2
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