INSITU INVESTIGATION OF SUBSTRATE SURFACE RE-CONTAMINATION DURING GLOW-DISCHARGE SPUTTER CLEANING

被引：8

|

作者：

KOMINIAK, GJ ^{[1
]}

UHL, JE ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期

关键词：

D O I：

10.1116/1.568816

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：170 / 174

页数：5

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