ANNEALING AND THICKNESS EFFECTS ON ELECTRICAL-RESISTANCE OF VACUUM-DEPOSITED TIN ANTIMONIDE ALLOY-FILMS

被引：9

作者：

DAMODARADAS, V ^{[1
]}

JAGADEESH, MS ^{[1
]}

机构：

[1] INDIAN INST TECHNOL,DEPT PHYS,THIN FILM LAB,MADRAS 600 036,INDIA

来源：

THIN SOLID FILMS | 1974年 / 24卷 / 02期

关键词：

D O I：

10.1016/0040-6090(74)90165-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：203 / 210

页数：8

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