FORMATION OF SHALLOW P(+)-N JUNCTIONS BY B(+) IMPLANTATION THROUGH A TISI2 SCREEN-FILM

被引：0
|
作者：
BAO, XM
YAN, H
MAO, BH
机构：
[1] NANJING ELECTR DEVICES INST,NANJING,PEOPLES R CHINA
[2] NANJING UNIV,SOLID STATE MICROSTRUCT LAB,NANJING,PEOPLES R CHINA
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1993年 / 137卷 / 01期
关键词：
D O I：
10.1002/pssa.2211370131
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：K21 / K24
页数：4
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