EFFECTS OF ION-IMPLANTATION ON THE INTERFACIAL PROPERTIES OF MOS SYSTEMS

被引：2
|
作者：
SAETTLER, M
LAUER, V
OFFENBERG, M
HEYERS, K
BALK, P
机构：
来源：
APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期
关键词：
D O I：
10.1016/0169-4332(89)90440-6
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：259 / 265
页数：7
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