DIRECT EVIDENCE OF ARSENIC CLUSTERING IN HIGH-DOSE ARSENIC-IMPLANTED SILICON

被引：40
|
作者：
WU, NR
SADANA, DK
WASHBURN, J
机构：
来源：
APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 08期
关键词：
D O I：
10.1063/1.94917
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：782 / 784
页数：3
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