SURFACE-ANALYSIS FOR SI-WAFERS USING TOTAL REFLECTION X-RAY-FLUORESCENCE ANALYSIS

被引：21

作者：

BERNEIKE, W ^{[1
]}

KNOTH, J ^{[1
]}

SCHWENKE, H ^{[1
]}

WEISBROD, U ^{[1
]}

机构：

[1] GESELL KERNENERGIEVERWERTUNG SCHIFFBAU SCHIFFAHRT,FORSCHUNGSZENTRUM GEESTHACHT GMBH,D-2054 GEESTHACHT,FED REP GER

来源：

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1989年 / 333卷 / 4-5期

关键词：

D O I：

10.1007/BF00572369

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：524 / 526

页数：3

共 50 条

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