TEXTURED ZNO THIN-FILMS FOR SOLAR-CELLS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

Textured ZnO films have been grown by metalorganic chemical vapor deposition (MOCVD) using diethylzinc (DEZ) and H2O as reactant gases. It was found that the surface morphology of films was strongly dependent on the substrate temperature. For the low substrate temperature of 150-degrees-C, the surface consists of uniformly sized tetrapodlike features. These undoped films have a high transparency in a wide wavelength range from 400 nm to 1400 nm. The low-resistivity ZnO films have also been successfully grown using a dopant gas of B2H6 diluted with H2. A sheet resistivity as low as 10 OMEGA/square was obtained.