DIFFUSION-CONTROLLED MOVING BOUNDARIES OF TERNARY AND BINARY OXIDES DURING INTERNAL OXIDATION OF DILUTE ALLOYS

被引：0
|
作者：
REDDY, SNS
RAGHAVAN, KS
PROBST, KH
机构：
[1] IBM CORP,DIV GEN TECHNOL,HOPEWELL JUNCTION,NY 12533
[2] INDIAN INST TECHNOL,DEPT MET,MADRAS 600036,TAMIL NADU,INDIA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 08期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C363 / C363
页数：1
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