PHOTOEMISSION SPECTRA FROM CONDUCTION BANDS AND CORE LEVELS OF SPUTTER-DEPOSITED TANTALUM FILMS

被引：12
|
作者：
PENCHINA, CM
机构：
[1] UNIV MASSACHUSETTS,DEPT PHYS & ASTRON,AMHERST,MA 01002
[2] MAX PLANCK INST FESTKORPER FORSCH,D-7000 STUTTGART,FED REP GER
来源：
PHYSICAL REVIEW B | 1976年 / 14卷 / 10期
关键词：
D O I：
10.1103/PhysRevB.14.4407
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：4407 / 4412
页数：6
相关论文
共 50 条
  • [41] DIFFUSION OF AU IN SPUTTER-DEPOSITED AMORPHOUS NINB FILMS
    PEERCY, PS
    DOYLE, BL
    WILEY, JD
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1981, 26 (03): : 389 - 389
  • [42] THE GROWTH OF SPUTTER-DEPOSITED SILVER-COPPER FILMS
    BARBER, ZH
    VACUUM, 1990, 41 (4-6) : 1102 - 1105
  • [43] Low Temperature Crystallization of Sputter-Deposited TiNi Films
    Kishi, Yoichi
    Ikenaga, Noriaki
    Sakudo, Noriyuki
    Yajima, Zenjiro
    STATE-OF-THE-ART RESEARCH AND APPLICATION OF SMAS TECHNOLOGIES, 2013, 78 : 81 - +
  • [44] Laser and sputter-deposited amorphous films for stress detection
    Meydan, T
    Williams, PI
    Grigorenko, AN
    Nikitin, PI
    Perrone, A
    Zocco, A
    SENSORS AND ACTUATORS A-PHYSICAL, 2000, 81 (1-3) : 254 - 257
  • [45] EFFECTS OF SUBSTRATE TEMPERATURE ON SPUTTER-DEPOSITED NIOBIUM FILMS
    SAITO, Y
    ANAYAMA, T
    JOURNAL OF LOW TEMPERATURE PHYSICS, 1975, 21 (1-2) : 169 - 177
  • [46] EFFECTS OF NITROGEN PULSING ON SPUTTER-DEPOSITED BERYLLIUM FILMS
    HSIEH, EJ
    PRICE, CW
    PIERCE, EL
    WIRTENSON, RG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 2165 - 2168
  • [47] Sputter-deposited TiNiPd alloy films on Si wafer
    Qian, SQ
    Wu, JS
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2005, 15 (04) : 868 - 872
  • [48] BACKSCATTERING SPECTROMETRY ON Ar SPUTTER-DEPOSITED FILMS.
    Kazama, Noriaki
    Fujimori, Hiroyasu
    Yamaguchi, Sadae
    Fujino, Yutaka
    Science Reports of the Research Institutes, Tohoku University, Series A: Physics, Chemistry and Me, 1983, 31 (01): : 16 - 27
  • [49] Physical and chemical properties of sputter-deposited TaCxNy films
    Aouadi, S. M.
    Zhang, Y.
    Basnyat, P.
    Stadler, S.
    Filip, P.
    Williams, M.
    Hilfiker, J. N.
    Singh, N.
    Woollam, J. A.
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2006, 18 (06) : 1977 - 1986
  • [50] Microhardness of sputter-deposited zirconia films on silicon wafers
    Pakala, M
    Walls, H
    Lin, RY
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1997, 80 (06) : 1477 - 1484
12345