DAMAGE CAUSED BY RF OXYGEN PLASMA ASHER

被引:4
|
作者
SAMUKAWA, S
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 08期
关键词
D O I
10.1143/JJAP.28.L1467
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L1467 / L1469
页数:3
相关论文
共 50 条
  • [1] Damage caused by RF oxygen plasma asher
    Samukawa, Seiji, 1600, (28):
  • [2] Impact of F species on plasma charge damage in a RF asher
    Gu, SQ
    Fujimoto, R
    McGrath, P
    2002 7TH INTERNATIONAL SYMPOSIUM ON PLASMA- AND PROCESS-INDUCED DAMAGE, 2002, : 88 - 91
  • [3] OXYGEN PLASMA ASHER
    PATTERSON, JE
    ANALYTICAL CHEMISTRY, 1979, 51 (07) : 1087 - 1089
  • [4] OXIDATION OF TIN IN AN OXYGEN PLASMA ASHER
    TOMPKINS, HG
    SELLERS, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 2446 - 2452
  • [5] PLASMA DAMAGE INDUCED ON SILICON SURFACE IN A BARREL ASHER
    FURUKAWA, M
    SUZUKI, H
    HARA, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (02) : 542 - 544
  • [6] Oxygen plasma asher contamination: An analysis of sources and remedies
    Synowicki, RA
    Hale, JS
    McGahan, WA
    Ianno, NJ
    Woollam, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (06): : 3075 - 3081
  • [7] Effect of oxygen plasma asher on poly(methylphenylsiloxane)-polyimide blends
    Tiwari, A
    Gupta, MK
    Nema, SK
    JOURNAL OF MATERIALS SCIENCE, 2004, 39 (05) : 1695 - 1701
  • [8] Effect of oxygen plasma asher on poly(methylphenylsiloxane)-polyimide blends
    A. Tiwari
    M. K. Gupta
    S. K. Nema
    Journal of Materials Science, 2004, 39 : 1695 - 1701
  • [9] Comparison of photosensitized plasma membrane damage caused by singlet oxygen and free radicals
    Kochevar, IE
    Lambert, CR
    Lynch, MC
    Tedesco, AC
    BIOCHIMICA ET BIOPHYSICA ACTA-BIOMEMBRANES, 1996, 1280 (02): : 223 - 230
  • [10] Oxygen atom density in capacitively coupled RF oxygen plasma
    Vrlinic, Tjasa
    Mille, Caroline
    Debarnot, Dominique
    Poncin-Epaillard, Fabienne
    VACUUM, 2009, 83 (05) : 792 - 796