BLANKET TUNGSTEN FILM FORMATION BY PHOTO-ENHANCED AND PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：0

作者：

TSUZUKU, S

NISHITANI, E

NAKATANI, M

SHINTANI, A

机构：

[1] HITACHI LTD,PROD ENGN RES LAB,TOTSUKA KU,YOKOHAMA 244,JAPAN

[2] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C314 / C314

页数：1

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