RU AND OS FILM DEPOSITION FROM METAL-CARBONYLS

被引：18

|

作者：

BERRY, AD

BROWN, DJ

KAPLAN, R

CUKAUSKAS, EJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 02期

关键词：

D O I：

10.1116/1.573473

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：215 / 218

页数：4

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